Publication Date

8-2024

Advisor(s) - Committee Chair

Ali Er, Ivan Novikov, Jasminka Terzic

Degree Program

Department of Physics and Astronomy

Degree Type

Master of Science

Abstract

This study investigates the synthesis and characterization of zirconium (Zr) thin films deposited on Si(100) substrates using pulsed laser deposition (PLD). The effects of two laser wavelengths (1064 nm and 532 nm), various substrate temperatures (25 °C, 300 °C, and 500 °C), and different laser fluences (0.25, 0.5, 1.0 J/cm²) on the properties of the Zr films were examined. Results indicated that smoother films were achieved with the 1064 nm wavelength, while surface roughness increased with higher fluences. Optimal crystalline films were obtained at a substrate temperature of 300 °C for both wavelengths. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) analyses revealed distinct patterns and peaks associated with the laser parameters. The XRD patterns showed that higher fluences improved film crystallinity up to a certain threshold. SEM and AFM images indicated more pronounced surface features at higher fluences and temperatures. Computational modeling of the film growth mechanisms, based on a continuum model, corroborated the experimental findings and provided insights into the effects of atomic flux, surface diffusion, and the Ehrlich-Schwoebel effect on film morphology. The study highlights the critical balance of deposition parameters needed to optimize Zr thin film quality, offering valuable guidelines for their application in advanced coatings and thin films in electronics, optics, and protective layers. This research provides a comprehensive understanding of the factors affecting Zr thin film deposition, paving the way for further advancements in the field of thin film technologies.

Disciplines

Condensed Matter Physics | Engineering Physics | Optics | Physics

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